DATA MANAGEMENT
ONE SIZE DOES NOT FIT ALL
DATA MANAGEMENT FOR THE SEMICONDUCTOR IC CHIP MANUFACTURING PIPELINE
Data Management is critical when we are collecting and transforming different data types from different manufacturing processes and converting them to improve semiconductor yield, quality, and reliability in the supply chain.
Situation
Over the years, improved semiconductor integration precision has resulted in enormous data handling demands on the lithography process writing circuit pattern data onto masks and chips. The process being upstream in the supply chain - precision, speed, and accuracy is key.
Our client is a manufacturer of complex equipment for the manufacture of semiconductor devices among them photomask writer. Mask writers used in semiconductor photomask manufacturing use complex systems that machinate precision geometry at the nanotechnology level, process enormous amounts of data at the 'tera' scale and also involve high precision and speed information processing technology. The circuit design printed onto the photomask and subsequently chips must go through various stages of data management involving conversion and validation to be in an acceptable format for input to the mask writer.
Objective
The objectives of the project were design, develop, and test functions for the machine DATA as follows:
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Converter for Mask Writer
Generator
Dump Tool
Checker
Library
Viewer Dashboard
Our client needed a reliant set of designed, tested, and deployed data management systems to operationalize the mask writers for their end stakeholders.
Mask writer needs data in binary machine format to be able to write the CAD design data onto the photomask. This needs to be generated using a sequence of Data Converter Tools.
Mask data preparation (MDP), also known as layout post processing, is the procedure of translating a file containing the intended set of polygons from an integrated circuit layout into set of instructions that a photomask writer can use to generate a physical mask. Typically, amendments and additions to the chip layout are performed in order to convert the physical layout into data for mask production.
Mask data preparation requires an input file which is in a GDSII or OASIS format, and produces a file that is in a proprietary format specific to the mask writer. [Ref]
The circuit pattern for the original design is initially written in human readable ASCII format or a similar language.The first Data Converter Tool converts this to a geometric pattern representative of technology mapping which indicates the geometric position of the hardware components on the mask. The proprietary input CAD binary data is converted to other binary formats and finally to Short Data Format(SDF) which is the end format accepted by the mask writer.
The information to be handled must be precise at the terabyte level with high speed and precision requiring deep domain expertise in designing of algorithms that convert, test, validate and store user generated CAD Design data to machine readable data.
Solution
The solution was designed and developed in different modules to meet processing needs at each stage:
Here is a workflow of the vision processing solution which involved input data processing, conversion to different formats,
dashboard display, and Image Processing for Defect Detection.
Data Generator
This software generates Mask Writer proprietary binary data from ASCII text file and is one of the first steps.
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Mask Writer proprietary format Data Generator
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Data Converter for Mask Writer
This type of software converts proprietary input binary machine data format to another proprietary binary format like:
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OASIS to Mask Writer proprietary format B Converter
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Mask Writer Format B to PDG Converter
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Mask Writer Format B to SDF Converter
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Data Dump Tool
This software generates ASCII text file from proprietary binary data format.
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Proprietary format B Dump Tool
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Format C Dump Tool
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Data Checker
This software checks and validates clients proprietary binary data format.
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Proprietary format B Data Checker
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SDF Data Checker
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OASIS Data Checker
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Data Library
This type of software reads proprietary binary data format and provide API set for accessing different information of the data.
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Proprietary format Data Library
Data Viewer
Through this software, user can open different mask data formats. It performs different viewing actions
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View
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Zoom in & out
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Scaling
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Mirroring
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Navigate
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etc.
Through this software, user can verify actual SEM image and binary data format.
Challenges
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Understanding different Data Formats
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Handling Big Data
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Multithreading for Process Optimization
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View time optimization using different pixel-based optimization and internal algorithm.
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Technology Used
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Linux Operating System
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GCC Compiler
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C, C++, Tcl,Shell scripts
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Image processing using OpenCV
Result
The volume of figure design data needed to describe the circuit patterns is comparable to the data volume of the latest HDD. The mask writer beam deflection controls can receive all the figure data without a single miss of order all within a couple of hours. This enables the writer beam mask writer with its cutting-edge processors to be able to parallel process large volumes of terabyte data with ultimate reliable data management algorithms and systems that enable writing one trillion figures without a single error. With the support from HTL, our client is well prepared to handle future increases in data volumes and processing to meet market demands for their machines.
Data Conversion & Verification for Defect Map
The figure below illustrates the schematic workflow of data conversion to SHOT Format and subsequent electron beam writing by mask writer and verification with an inspection machine to detect defects on viewer dashboard of proprietary binary data format comparison after scanning with scanning electron microscope (SEM) image.
